Polish compositions for gloss enhancement, and method

ABSTRACT

A composition and method for use in imparting or maintaining a glossy or shiny finish on a hard surface. In one embodiment, the composition comprises a base polish component or components, and at least one poly[oxyalkylene] ammonium cationic surfactant. In another embodiment, a method of imparting a glossy finish on a hard surface by applying a composition to the hard surface, the composition comprising at least one poly[oxyalkylene] ammonium cationic surfactant. In some such embodiments, the composition comprises a base polish and the poly[oxyalkylene] ammonium cationic surfactant is dispersed in the base polish. Preferably, the poly[oxyalkylene] ammonium cationic surfactant comprises in the range of about 0.01 to about 10 wt. %, more preferably in the range of about 0.05 to about 5 wt. %, and more preferably in the range of about 0.1 to about 1 wt. % of the total composition.

RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.09/602,756 that was filed with the United States Patent and TrademarkOffice on Jun. 23, 2000 now U.S. Pat. No. 6,551,974, U.S. applicationSer. No. 09/602,756 is a continuation-in-part of U.S. application Ser.No. 09/461,861 that was filed with the United States Patent andTrademark Office on Dec. 15, 1999 and issued as U.S. Pat. No. 6,339,054on Jan. 15, 2002. U.S. application Ser. No. 09/461,861 is acontinuation-in-part of U.S. application Ser. No. 09/295,035 that wasfiled with the United States Patent and Trademark Office on Apr. 20,1999 and issued as U.S. Pat. No. 6,350,725 on Feb. 26, 2002. Thedisclosures of U.S. application Ser. Nos. 09/602,756, 09/461,861 and09/295,035 are incorporated herein by reference.

FIELD OF THE INVENTION

The invention relates to compositions and methods useful for impartingor maintaining a glossy or shiny finish on a hard surface. Morespecifically, the invention relates to compositions and methods usefulfor imparting or maintaining an increased level of gloss or shine to ahard surface, for example, the surface of vehicles such as cars, trucks,vans, buses, railway trains, boats, motorcycles, snowmobiles, trailers,and the like.

BACKGROUND OF THE INVENTION

It is desirable to keep many exposed hard surfaces, such as the surfacesof vehicles, clean and polished for reasons which include at leastmaintaining the appearance of the surface, minimizing surfacetarnishing, reducing paint wear and fading if the surface is painted,and preventing corrosion on the surface. Each of these adverse affectson the hard surfaces of vehicles is at least in part contributed to bymaterials, which collect on the vehicle during use and storage. It iswell known that regular polishing of the vehicle can assist inmaintaining the appearance of the vehicle and can even extend its usefullife where corrosion damage is concerned. It is therefore desirable tohave products available to the market place, which can assist in thepolishing of vehicle surfaces.

There is a vast array of polishes commercially available that areintended for use on many surfaces, including vehicles. Many of suchpolishes may perform a suitable job of imparting a glossy or shinyfinish to a surface when used properly. However, it is generallydesirable to improve the performance of such polishes, or to providebetter polish compositions.

SUMMARY OF THE INVENTION

The inventors have developed a new composition and method for use inimparting or maintaining a glossy or shiny finish on a hard surface. Inone embodiment, the composition comprises a base polish component orcomponents, and at least one poly[oxyalkylene] ammonium cationicsurfactant. The inventors have discovered that the combination of the atleast one poly[oxyalkylene] ammonium cationic surfactant within a polishbase component or components provides a final polish composition havingimproved gloss or shine imparting properties.

Another embodiment is a method of imparting a glossy finish on a hardsurface. The method includes applying a composition to the hard surface,the composition comprising at least one poly[oxyalkylene] ammoniumcationic surfactant. In some such embodiments, the composition comprisesa base polish and the poly[oxyalkylene] ammonium cationic surfactantdispersed in the base polish.

Preferably, the poly[oxyalkylene] ammonium cationic surfactant comprisesin the range of about 0.01 to about 10 wt. %, more preferably in therange of about 0.05 to about 5 wt. %, and more preferably in the rangeof about 0.1 to about 1 wt. % of the total composition.

As used herein “polish” or “polishes” means any solid, semi-solid, orliquid mixture or dispersion that which when used on a surface impartssmoothness, surface protection, or a decorative finish on that surface.The terms “base polish” or “base polish components” or “polish matrix”refers to a polish, or components that can be used to make a polish,that does not include a poly[oxyalkylene] ammonium cationic surfactant.The poly[oxyalkylene] ammonium cationic surfactant is added to the basepolish to provide a novel polish composition. Preferred base polishesinclude those having at least one polishing agent selected from a filmforming agent, an abrasive agent, a cleaning agent, or mixtures thereof.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

In at least one embodiment, the invention comprises a composition withat least two basic components therein: at least one poly[oxyalkylene]ammonium cationic surfactant, and a base polish.

Poly[oxyalkylene] Ammonium Cationic Surfactant:

The alkoxylated (e.g., polyalkylene) ammonium cationic surfactant is aningredient of particular note within the composition. These cationicsurfactants are commercially available, for example, as Witco ChemicalsCationic quaternary ammonium compounds Emcol CC-9, Emcol CC-36, andEmcol CC-42. A preferred compound is commercially provided as GLENSURF™42, which is inaccurately described as “Diethylammonium Chloride” in aPRODUCT DATA SHEET provided by Glenn Corporation, which sells theproduct. The CAS Number for the actual compound is 68132-96-7, itsChemical Abstract name is Poly[oxy(methy-1,2-ethanediyl)],alpha-[2-diethyl Methylammonio) ethyl]-omega-hydroxyl chloride, and itschemical formula is listed as (C₃H₆O)_(n)C₇H₁₈NO) Cl.

The alkoxylated ammonium cationic surfactants used in the presentinvention may be generally defined according to the formula:

wherein R, R¹ and R² are independently selected from lower alkyl groups(C1-C4 alkyl groups), R³ comprises a polyoxyalkylene chain, and Xcomprises an anion (any anion is useful, acid anions preferred, such aschloride, iodide, bromide, fluoride, acetate, phosphate, sulfate, etc.).A preferred type of polyoxyalkylene chain (also referred to as apoly[oxyalkylene] chain) would have the general formula:

wherein m is from 0 to 30, n is from 1 to 60, and m plus n is from 1 to60, and n>m. It is preferred that the ratio of n/m is at least 2, morepreferred that n/m is at least 4, and still more preferred that n/m isgreater than 5 or even that m=0. It is also preferred that m+n is withinthe range of 5 to 60, still more preferred that m+n is within the rangeof 8 to 50, the most preferred being where m=0 and n=35-45 (e.g., 42).

The anion is fairly inert in the system except for its solubilitycharacteristics, which are well understood in the art. Simple anions,especially simple or lower molecular weight acid anions such aschloride, bromide, iodide, sulfate, paratoluene sulfonate, acetate,nitrate, nitrite, phosphate, and the like are conveniently selected asthe counterion ion in the cationic surfactant. It is an option that thetotal number of carbon atoms among R, R¹ and R² have a combined numberof fewer than 12 carbon atoms (with the possible maximum being 12 carbonatoms). It is an additional option that the total number of carbon atomsin the R, R¹ and R² groups are between 3 and 12 carbon atoms or between4 and 8 carbon atoms. The most common form of this class of surfactantshas R, R¹ and R² as one methyl radical and two ethyl radicals.

In describing compounds by structure and formula in the practice of theinvention, it is well understood that substitution of the compoundswould be practiced within the background skill of one ordinarily skilledin the art.

These poly[oxyalkylene] ammonium cationic surfactants, by themselves,and particularly in combination with other components of thecomposition, contribute to the beneficial characteristics of thecomposition, including: 1) improved overall polishing performance ascompared to compositions which are otherwise identical except for thepresence of these poly[oxyalkylene] ammonium cationic surfactants; 2)enhanced drying performance when desired in combination with any or allof the remaining components of the compositions; 3) reduced detrimentalsurface appearance or no detrimental surface appearance (even though theevidence is clear that at least some of the compositions of theinvention are persistent and leave material on the polished surface,especially as evidenced by the persistent improved drying rate of thesurface after treatment, the appearance of the surface is quite good,with good reflectivity, no dulling or matte-like appearance, and nodiscoloration); and 4) a substantive glossy or shiny appearance to thefinish (providing good reflectivity, and a polished appearance to thesurface). These combinations of properties are best obtained by the useof these polyoxyalkylene ammonium cationic surfactants, especially incombination with the rest of the components described below for use inthe present invention.

These compounds are described in U.S. Pat. Nos. 3,123,640 and 3,141,905,which are incorporated herein by reference, as cation-activesurface-active chemical compounds. The cation-active compounds arequaternary ammonium compounds derived from lower monoalkyldialkanolamines. The cation-active compounds also include a)dialiphatic, dialkoxylated quaternary ammonium compounds, and b)monoaliphatic, trialkoxylated quaternary ammonium compounds, asdescribed by formulae in the patents, and is useful in the practice ofthe invention as the polyoxyalkylene ammonium cationic surfactants.

In the description of chemical structures and formulae, where the term“group” is used, that terminology is specifically intended to reflectthe ability of one ordinarily skilled in the art to use substituted orunsubstituted materials from within the defined class. With regard tothe specific example of “alkyl group,” that term would reflect and isintended to cover not only hydrocarbons which literally fit within thedefinition of alkyl (e.g., methyl, ethyl, propyl, hexyl, cyclohexyl,isooctyl, dodecyl, stearyl and the like), but also those types ofsubstituted alkyl compounds which one of ordinary skill in the art wouldselect for minor or specifically intended variations in the physicaland/or chemical properties effected by the substitution such aschloromethyl, hydroxy-ethyl, ethylene sulfonate, 4-cyanobutyl,ethylene-ethyl ether (—CH₂CH₂OCH₂CH₃), ethylene-ethyl thioether, dodecylcarboxylate (and its ester), 3,4-dibromobutyl, and the like. Where theterm “alkyl moiety” is used, that term encompasses only unsubstitutedalkyl. Similarly, the term a “compound having the central nucleus”refers to all chemical compounds which have the identified chemicalstructure defined for the nucleus, with the option of havingsubstitution thereon which does not alter the bond structure defined inthe formula. For example, a central structure of the formula:

would include, phenyl, para-hydroxy phenyl, 1,3-dichlorophenyl,2,4,6-trimethylphenyl, naphthyl, benzamidazol (attached through thebenzyl ring), and the like, but would not include cyclohexane,piperidine, or the like, as those changes alter the bond structure ofthe ring. The terminology of a ring or substituent of the formula limitsthe structure to the specific groups and positions for substitution asshown.The Base Polish:

As defined above, the terms “base polish” or “base polish components” or“polish matrix” refers to a polish, or components that can be used tomake a polish, to which the poly[oxyalkylene] ammonium cationicsurfactant is included to provide the composition of the invention. Thebase polish can be any of a broad variety of polish formulationsgenerally known in the art, and can be in the form of a solid,semi-solid, or liquid. Preferably, the base polish used is formulatedsuch that the poly[oxyalkylene] ammonium cationic surfactants can besuitably dispersed within the base polish.

The base polish preferably includes a vehicle or diluent component intowhich the other components are dispersed. Preferably, the base polishincludes at least one polishing agent component, such as an abrasive, acleaner, or film former, and other optional ingredients, such assurfactants, emulsifiers, thickeners, stabilizers, drying agents,brightening agents, antifoaming agents, foaming agents, antioxidants,humectants, coupling agents, additional solvents, fragrances, dyes,biocides, and the like, that are useful in providing a homogeneous,stable product that has beneficial use properties, and has enhanced theaesthetic qualities. Preferably, the base polish is an emulsion or asolvent-based dispersion. If the composition is an emulsion, it ispreferably either oil in water emulsion, or a water in oil emulsion.

Vehicle or Diluent

The vehicle or diluent is any of a broad variety generally known for usein polish compositions. Examples of suitable vehicles or diluentsgenerally include water, and organic solvents that are preferably notharmful to the surface being treated. Examples of preferred organicsolvents include aliphatic hydrocarbons, aromatic hydrocarbons, mineralseal oil, chlorinated organic solvents. These solvents also providelubricity during mechanical polishing steps. Specific names and tradenames would include: mineral spirits/stoddard solvent (saturated C8-C12hydrocarbons), solvent 140, Isopar (C, E, G, H, K, L, M, V)(commercially available from Exxon Corp.). Most preferably, the basepolish is a water in oil, or an oil in water emulsion, or is an aqueousbased composition using water as the primary vehicle or diluent.

Polishing Agents

Preferably, one or more polishing agents are dispersed within thevehicle or diluent. The polishing agents act on the surface beingtreated to impart smoothness, surface protection, or a decorative finishon the surface.

One example of a polishing agent are abrasives. Abrasives are intendedto remove contaminants, and provide a smooth glossy texture to thesurface being polished. Examples of abrasives include aluminumsilicates, diatomaceous earth, silicates, kaolin clay, attapulgite clay,and other clay bond cleaners, microcrystalline silica, silicon dioxide,polyamide powders, alumina hydrate, amorphous silica and the like, orother materials to provide abrasive material for polishing surfaces,especially vehicle surfaces. Suitable silicates include metasilicates,orthosilicates (such as in the form of sodium or potassium metasilicateor sodium or potassium orthosilicate), and the like.

One suitable source of diatomaceous earth is Super Floss commerciallyavailable from Celite Corportion.

Some suitable examples of abrasive silica microcrystalline are Imsil A-8and Imsil A-10 commercially available from Unimin Specialty Minerals,Inc.

A clay based abrasive that is suitable for use is commercially availablefrom Kaopolite Corp. under the name Kaopolite SF.

Another example of polishing agents includes cleaning agents, whichremove contaminants, and provide a smooth glossy texture to the surfacebeing polished. Suitable examples of cleaning agents include alkalineagents, clay based cleaners and others generally known. Clay basedcleaners also may act as abrasives, and therefore overlap into theabrasives category. Clays can both remove contaminates and smooth asurface by removing minor scratches.

Preferred cleaning agents include alkaline agents. Many alkaline agentsare known in the art, but preferred alkali agents include metalphosphates, metal carbonates, and metal hydroxides, particularly alkalior alkaline metal hydroxides such as NaOH and KOH.

In some examples, the alkaline agents can be combined with a fatty acidester to form soap. The soap can act as both a cleaner, lubricant, andan emulsifying agent. For example, in some embodiments, KOH and a fattyacid ester, such as oleic acid, can form the soap. One source ofsuitable oleic acid is Pamak 4A commercially available from HerculesIncorporated.

Other conventional and non-conventional cleaning solution additives maybe added in the practice of the present invention. Where shelf stabilityof the polishing product (as a concentrate or as a ready-to-use product)is important, the cleaner additives should not react with otheringredients to change the performance of the system adversely or causecomponents to precipitate or separate within the mixture of dispersion.

Another example of polishing agents includes film forming agents. Filmforming agents spread over the surface being polished and act to laydown a glossy film on the surface. The film can act in both a protectiveor decorative function. In some embodiments, buffing of the film formingagent is required to provide a final glossy finish. In otherembodiments, no buffing is required. Examples of suitable film formingagents include waxes, silicones, curable resins and liquid hydrocarbonpolymers.

Any wax generally known in the art, and that is suitable for use in thecomposition being formulated can be used. Soft waxes, hard waxes, andblends thereof can be used. Examples of suitable waxes include paraffin,petroleum waxes, such as microcrystalline petroleum waxes, carnauba,candelilla vegetable waxes, montan waxes derived from coal, syntheticpolymer waxes, for example oxidized polyethylene,polytetrafluoroethylene (PTFE) and polyamides, and the like, andmixtures thereof. One suitable source of wax is Tomah C-340 Emulsioncommercially available from Tomah Products.

Silicones are another type of film forming agents that spread over thesurface to provide a protective or decorative film. Any siliconegenerally known in the art, and that is suitable for use in theparticular composition being formulated can be used. Examples ofsuitable silicones include dimethylsilicones, aminofunctional silicones,and the like. Examples of some suitable sources of silicones are DowCorning 530 and Dow Corning 531 commercially available from Dow CorningCorporation

Additional Ingredients

In addition to the diluent or vehicle, and the polishing agents, thebase polish, and therefore the final composition, can include additionaloptional ingredients, such as surface active agents (emulsifying agents,wetting agents, detergents), thickeners, stabilizers, drying agents,brightening agents, antifoaming agents, foaming agents, coupling agents,additional solvents, fragrances, dyes, preservatives, humectants and thelike, that are useful in providing a homogeneous, stable product thathas beneficial use properties, and has enhanced the aesthetic qualities.

Surface Active Agents

When the composition is a liquid or a semi-solid dispersion, surfaceactive agents, or mixtures thereof, are preferably included to helpproduce a homogeneous, stable product. Surface active agents are anycompound that reduces interfacial tension between two liquids, orbetween a liquid and a solid, or that reduces surface tension whendissolved in water or water solutions. Examples of surface activeagents, or surfactants, include wetting agents, emulsifiers, detergents,and the like.

Preferably, the surfactant or surfactants used are non-ionic or anionicsurfactants. A non-ionic, anionic surfactant, or mixtures thereof arepreferably used in an amount which would provide the desired effect ofsolubilizing at least some of the components to provide a stablecomposition.

Non-ionic and amphoteric surfactants are also well known in the art.Many of these may contain polyoxyalkylene chains within the molecule,with appropriate end groups altering the hydrophilic/hydrophobic balanceof the compound. The oxylakylene component is often selected fromoxypropylene (CH₂CH₂CH₂—O—) or oxyethylene (CH₂CH₂—O—) linkages,preferably with the majority or entirety of the groups in theoxyalkylene chain being oxyethylene linkages. More specific knownclasses of these non-ionic surfactants are known in the literature asnon-ionic alkoxylates, non-ionic alkylphenol polyethers, alcoholalkoxylates (e.g., specifically alcohol ethoxylates and alcoholpropoxylates and mixed ethoxylates/propoxylates), non-ionic condensatesof branched chain primary or secondary alcohols and alkylene (especiallyethylene) oxides, alkoxylated amines, amine oxides, non-ioniccondensates of fatty acids and alkylene oxides, and the like. These areart-recognized classes well understood by the ordinary surfactantchemist.

Examples of such nonionic surfactants are found in “Surface ActiveAgents and Detergents,” Volumes I and II, Interscience Publications andU.S. Pat. Nos. 2,992,108; 3,068,101; 3,210,152; 3,165,409; and FrenchPatent Nos. 1,556,240 and 1,497,930, all of which are incorporatedherein by reference. Amphoteric surfactants are also well known in theliterature and include, merely as examples thereof, betaines (such asamidoalkyl betaines), and the like. Examples of such compounds are foundin U.S. Pat. No. 3,573,049, which is incorporated herein by reference.

The non-ionic surfactants Tween 60 and Span 80, both commerciallyavailable from Uniqema ICI Americas, have been found to be particularlybeneficial surfactants in at least some embodiments.

Anionic surfactants are materials well known in the cleaning, detergent,and general materials composition art. Examples of anionic surfactantsinclude organic carboxylates, organic sulfonates, organic sulfates,organic phosphates and the like, particularly linear alkylarylsulfonates, such as alkylarylcarboxylates, alkylarylsulfonates,alkylarylphosphates, and the like. These are art-recognized classes wellunderstood by the ordinary surfactant chemist.

Thickeners and Stabilizers

Suitable thickeners or stabilizers for use include those generally knownin the art, and that are suitable for use in the particular compositionbeing formulated. A thickener, or thickening agent, is any of a varietyof substances used to increase the viscosity of liquid or semi-liquidmixtures or solutions, and in some instances, to aid in maintainingstability of such mixtures or solutions by emulsifying properties.Thickeners can also provide flow characteristics as desired, such thatthe formulation can spread evenly and adhere to vertical surfaces.Examples of suitable thickeners include carboxymethylcellulose,polyacrylates and xanthum gum. One suitable example is carbomer/carbopol940 commercially available from BF Goodrich.

Thickeners may also act as fillers to increase the bulk or volume ofliquid, semi-liquid, or solid mixtures or solutions. Suitable fillermaterial for example, can include talc, clays (kaolin, attapulgitebentonite) and mica. One particularly suitable filler is Satintone 5clay filler commercially available from Engelhard Corporation. Suitablestabilizers include those generally known in the art, and that aresuitable for use in the particular composition being formulated. Astabilizer, or stabilizing agent is any of a number of substances thattends to keep a composition, mixture, or solution from changing its formor chemical nature.

Preservatives

Preservatives can be included in the formulation to maintain or preservethe formulation. Examples of some preservatives include antioxidants andbiocides, and the like. Suitable antioxidants include those generallyknown in the art for use in polish, and that are suitable for use in theparticular composition being formulated. An antioxidant is a particulartype of preservative that is added to retard oxidation and deteriorationof components of the composition. Some examples include ButylatedHydroxyanisole (BHA), Butylated Hydroxytoluene (BHT), propyl gattate,and others generally known.

Suitable biocides agents include those generally known in the art, andthat are suitable for use in the particular composition beingformulated. Biocides include any substance that inhibits the growth ofmicroorganisms such as bacteria, molds, slimes, fungi, viruses, and thelike. Examples of suitable biocides include methyl and proply parabens,sodium o-phenylphenol, aldehydes (formaldehyde, glutaraldehyde), amines(quaternary compounds, amine and diamine), sulfur compounds(isothiazolone, carbamates, metronidazole), quaternary phosphoniumsalts, thiazolinones, zinc pyrithione, gluconate, and the like.

Drying Agents

Suitable drying agents include those generally known in the art, andthat are suitable for use in the particular composition beingformulated. A drying agent is a material that modifies the rate ofevaporation for part or all of the liquid portion of the formula. Rateof drying can be important because it determines the length of time thatthe product can be applied to the surface in a fluid form. It alsodetermines the time required for the mixture to dry on the hard surfaceprior to other subsequent chemical and mechanical steps. A drying agentprimarily affects the evaporation rate by modifying the vapor pressureof the mixture. Typical examples of drying agents are low boiling pointsolvents. These include aliphatic and aromatic hydrocarbons such asmineral spirits, kerosene, terpines, and chlorinated organic solvents.Particularly suitable drying agents include Isopar K Solventcommercially available by Exxon Chemical and Mineral Spirits 66 madecommercially available by Ashland Chemical.

Dyes, Odorants, and other Aesthetic Enhancing Agents

Various dyes, Odorants including perfumes, and other aesthetic enhancingagents may also be included in the composition. Dyes may be included toalter the appearance of the composition, as for example, Direct Blue 86(Miles), Fastusol Blue (Mobay Chemical Corp.), Acid Orange 7 (AmericanCyanamid), Basic Violet 10 (Sandoz), Acid Yellow 23 (GAF), Acid Yellow17 (Sigma Chemical), Sap Green (Keystone Analine and Chemical), MetanilYellow (Keystone Analine and Chemical), Acid Blue 9 (Hilton Davis),Sandolan Blue/Acid Blue 182 (Sandoz), Hisol Fast Red (Capitol Color andChemical), Fluorescein (Capitol Color and Chemical), Acid Green 25(Ciba-Geigy), FD&C Yellow (Pylam Products), Orange (Keystone Analine andChemical), and the like.

Fragrances or perfumes that may be included in the compositions include,for example, terpenoids such as citronellol, aldehydes such as amylcinnamaldehyde, a jasmine such as C1S-jasmine or jasmal, vanillin,banana (Arylessence), and the like.

Examples of suitable biocides include methyl and proply parabens, sodiumo-phenylphenol, aldehydes (formaldehyde, glutaraldehyde), amines(quaternary compounds, amine and diemine), sulfur compounds(isothiazolone, carbamates, metronidazole), quaternary phosphoniumsalts, thiazolinones, zinc pyrithione, gluconate, and the like.

Particularly suitable biocides include Dowicide A and Dowicil 75commercially available from Dow Chemical Corporation.

Humectants

Humectants may also be included in the formulation, as desired. Ahumectant is a substance having an affinity for water with stabilizingaction on the water content of the formulation. Examples of suitablehumectants include glycerol, glycerine and sorbitol.

As will be understood by those of skill in the art, and others,additional ingredients and components can also be included within thebase polish, and the composition of the invention. The above discussionillustrates some embodiments of the invention, but is not intended tolimit the scope of possible formulations of the invention.

pH

Adjustment of pH can be important in some formulations that involveneutralization of other components to achieve certain functionalproperties. For example, reacting an alkalinity source with fatty acidto form a soap, or reacting an alkalinity source with polyacylic acid toform a polymer salt that acts as a thickener.

In some embodiments, the compositions hereof will preferably beformulated such that during use in polishing operations, the compositionwill have a pH of between about 5 and about 13, preferably between about6 and about 12, and more preferably between about 7 and about 10.Techniques for controlling pH at recommended usage levels include theuse of buffers, alkali, acids, etc., and are well known to those skilledin the art, and can be employed in formulating the composition.

The Composition:

As discussed above, the composition of the invention includes at leastone poly[oxyalkylene] ammonium cationic surfactant and the base polish,or components of a base polish.

The concentration of the alkoxylated ammonium cationic surfactant withinthe composition can be varied over a wide range, and the variations havebeen shown to have significant effects dependent upon which solutionsare being used. Although the alkoxylated ammonium cationic surfactantmay be used in concentrations of from about 0.01 to about 10% by weight(wt. %) in use compositions, they are preferably provided in amounts offrom about 0.05 to about 5 wt. %, and more preferably from about 0.1 toabout 1 wt. %. The higher levels of the alkoxylated ammonium cationicsurfactant may be particularly beneficial in waxing or polishcompositions, the alkoxylated cationic ammonium cationic surfactantacting to provide a significantly and observably better shine whenapplied in these compositions. The amounts of the alkoxylated ammoniumcationic surfactant applied in these polish or wax compositions may bebetter provided in the higher end of the concentrations.

One type of preferred embodiment of the invention includes a compositionthat comprises at least one cationic surfactant comprising at least onepoly[oxyalkylene] ammonium cationic surfactant, and a base polishcomprising at least one non-ionic surfactant (as defined and describedabove), at least one diluent or vehicle (as described above), at leastone polishing agent (e.g., abrasive, cleaner, or film former, and thelike), and optionally the various other types of general ingredientsdescribed herein and in the art in general. Such general ingredientsmight include, for example, thickening agents, drying agents,preservatives, dyes, fragrance, humectants, and the like.

Representative constituent concentrations for components of somecompositions embodying the invention can be found in Table 1, whereinthe values are given in wt. % of the ingredients in reference to thetotal composition weight:

TABLE 1 Preferred wt. % More Preferred Most Preferred Component Rangewt. % Range wt. % Range Diluent or vehicle 10 to 90  20 to 80 30 to 70Polishing agent 5 to 90 20 to 80 30 to 50 (abrasive, cleaner, filmformer, or mixtures thereof) Surface active agents 0 to 10 0.1 to 5.01.0 to 3.0 Additional Ingredients 0 to 40 0.01 to 30   0.1 to 20 poly[oxyalkylene] 0.01 to 10   0.05 to 5   0.1 to 1   ammonium cationicsurfactants

Some preferred embodiments comprise the constituent concentrations forbase components as found in Table 2, wherein the values are given in wt.% of the ingredients in reference to the total composition weight.

TABLE 2 Preferred wt. % More Preferred Most Preferred Component Rangewt. % Range wt. % Range Aqueous Diluent 0 to 90 20 to 80  30–70Non-Aqueous Diluent 0 to 90 1 to 50 5 to 40 Abrasive Agent 0 to 30 0 to10 0 to 5  Cleaning agent 0 to 30 1.0 to 10   2.0 to 10.0 Wax (filmforming 0 to 30 0 to 20 0 to 10 agent) Silicone (film forming 0 to 30 0to 20 0 to 10 agent) Surfactant 0 to 10 0.1 to 10   0.5 to 3.0 Thickeners 0 to 20 0 to 10 0.5 to 5.0  Drying Agent 0 to 60 5 to 50 10to 25  Biocide Preservative 0 to 10 0.01 to 1.0  0.01 to 0.1  Fragrance0 to 10  0 to 1.0  0 to 0.5 Dye 0 to 10  0 to 1.0  0 to 0.1poly[oxyalkylene] 0.01 to 10   0.05 to 5    0.1 to 1   ammonium cationicsurfactants

Depending upon the formulation, as with the base polish, the compositionof the invention can be a liquid, semi-liquid, or solid, and can be inthe form of a concentrate or ready-to-use formulation. The compositiongenerally has a capability of being used on a wide range of surfaces,and in some embodiments is particularly suited for use on vehiclesurfaces.

The compositions embodying the invention can be used in a broad varietyof polishing applications. Some examples include manual or machinepolishing and the like. These compositions and methods may be usedmanually, with hand operated polishing equipment or in automaticpolishing equipment.

The composition can be used with any suitable application method knownin the art. For example, low pressure application, hand pressureapplication, water jet spray apparatus or other manual or mechanicalapplication methods and systems can be used, depending upon the form ofthe polish. Some embodiments of the compositions are applied, allowed todry, and then removed or buffed off. Other embodiments are applied andworked into the surface immediately. Still other embodiments are appliedin a solution, such as an aqueous solutions, and are allowed to dry. Forexample, some such aqueous based compositions are contemplated to beapplied in automatic car wash applications.

The composition can be provided as a ready-to-use formulation, or can beprovided as a concentrate designed to be diluted with water or othersolvent to form a use formulation. Generally, the ratio of concentrateto solvent (typically water) is within the range of from about 1:300 to1:10, but may be diluted to any proportion within that range or lessefficiently diluted by a lesser amount (e.g., 1:2). In spray onapplications, the composition can be either pre-diluted before beingintroduced to the spray apparatus, or can be mixed in situ duringspraying.

The compositions of the invention, particularly where metal surfaces(including painted or coated metal surfaces, as well as raw or anodizedsurfaces, such as aluminum) or composite surfaces are desired to bepolished, and especially the exterior surfaces of vehicles are to bepolished, are particularly effective and beneficial. General areas ofuse for these materials and processes include, but are not intended tobe literally limited to manual, and automatic polishing, and arepreferably adapted for use on vehicles, especially for cars, trucks,motorcycles, trains, boats, trailers, and off-road vehicles such asATV's, and snow-mobiles.

The polishing environment may include outside (unenclosed) polishingsystems or operations, housed (enclosed) polishing units or operations,transient polishing systems or operations (e.g., where the vehicles movein assembly-line, conveyed fashion through the system, orpolish-in-place systems where the vehicle, device or apparatus is placedinto a closed environment and the polishing steps are performed on thevehicle device or apparatus while it is confined within theenvironment.)

There is a definite, observable benefit in the use of thepoly[oxyalkylene] ammonium cationic surfactants in polish applications,particularly to car and vehicle bodies during polish operations. Thereis a visible improvement in the shine or gloss of the surface when thepoly[oxyalkylene] ammonium cationic surfactant is present in the polishcompositions than in similar polish compositions tried.

The exact functional mechanism by which the alkoxylated ammoniumcationic surfactant affects the polishing is not understood. Thisrenders it all the more surprising that an unknown phenomenon isoccurring in the application of the alkoxylated ammonium cationicsurfactant that provides this unexpected benefit.

The above specification provides a basis for understanding the broadmeets and bounds of the invention. The following examples and test dataprovide an understanding of certain specific embodiments of theinvention. The invention will be further described by reference to thefollowing detailed examples. These examples are not meant to limit thescope of the invention that has been set forth in the claims. Variationwithin the concepts of the invention are apparent to those skilled inthe art.

EXAMPLES Example 1 One Step Cleaner Wax Composition

The components and concentrations for one example of a one step cleanerwax composition embodying the invention is set fourth in Table 3,wherein the values are given in wt. % of the components in reference tothe total composition weight:

TABLE 3 ONE STEP CLEANER WAX GENERAL FUNCTION MATERIAL OF COMPONENT WT.% Mineral Spirits Drying Agent 20.5322 Dow Corning 530 Silicone FilmFormer 4.2660 Dow Corning 531 Silicone Film Former 0.6570 Span 80Surfactant 0.5715 Kaopolite SF Clay Based 4.000 Cleaner/Polish WaterVehicle or Diluent 60.0533 Satintone 5 Clay Thickener/Filler 4.3785Tomah C-340 Emulsion Wax film former 2.4885 Tween 60 Surfactant 0.2Imsil A-8 Microcrystalline Silica 1.6770 Abrasive Imsil A-10Microcrystalline Silica 0.8330 Abrasive Dowicide A Biocide(Preservative) 0.09 Banana Fragrance Fragrance 0.14 FD&C Yellow Dye Dye0.008 Orange Dye Dye 0.0050 GLENSURF 42 Gloss Enhancement 0.1poly[oxyalkylene] ammonium cationic surfactant

The ingredients were added in the order listed using a high shearemulsifier.

Example 2 Automotive Polishing Composition

The components and concentrations thereof for an example of anautomotive polishing composition embodying the invention is set fourthin Table 4, wherein the values are given in wt. % of the ingredients inreference to the total composition weight:

TABLE 4 AUTOMOTIVE POLISHING COMPOSITION MATERIAL GENERAL FUNCTIONPERCENT Water Diluent or Vehicle 43.664 Carbomer 940 Thickener 0.08Dowicil 75 Biocide/Preservative 0.056 Glycerine Humectant/GlossEnhancement 2.0 Tween 60 Surfactant 1.6 Pamak 4A (Oleic Acid) Used withKOH, 45%, to form 2.4 soap/emulsifier Mineral Spirits Drying aid 12Mineral Oil Diluent/Lubricant 7.2 Polestar 400 Clay Cleaner/Polish 10.4KOH, 45% Used with Pamak A4 (Oleic 0.4 Acid) to form soap/emulsifierImsil A-8 Microcrystalline Silica Abrasive 13.336 Imsil A-10Microcrystalline Silica Abrasive 6.664 GLENSURF 42 poly[oxyalkylene]ammonium 0.1 cationic surfactant

The ingredients were added in the order listed using a high shearemulsifier.

Example 3 Laboratory Comparative Testing

Laboratory evaluations were conducted comparing the gloss imparted on asurface by a standard polishing compound product and a modified versionof the same product including a small amount of Glensurf 42 cationicsurfactant. Four different laboratory evaluations were conducted.

Laboratory Testing Procedures:

The laboratory evaluations comparing polishing compositions wasconducted according to the following general procedure:

-   1. Two sections of a roof cut-out panel were wet sanded by hand with    1,500 grit sandpaper.-   2. Glossmeter readings were taken on both sections to assess the    level of gloss. A Gardner glossmeter was used.-   3. Product was applied to each of the two sections. One section made    use of the standard polishing compound product and the other section    used a modified version of the same product. In the evaluations    considered here the modification was to add a small amount of    GLENSURF™ 42 cationic surfactant.-   4. A wool buffer pad was used to distribute the products about the    panel section. A different wool pad was used for each product.-   5. The high speed buffer (1,800 RPM), having the attached wool pad    designated for that product, was then turned-on. The panel sections    were buffed in a similar manner.-   6. Following the high speed buffing with the wool pad, the gloss of    the panel section was measured in ten locations.-   7. A second application of the same product was made to each of the    sections.-   8. A high speed buffer (1,800 RPM), having a foam pad was used. A    different pad was used for the two sections. One for the standard    product and one for the product containing the GLENSURF™ 42 cationic    surfactant. The panel sections was buffed in a “checker board”    pattern of two directions. Both sections were buffed in a similar    manner.-   9. Following the high speed buffing with the foam pad, the gloss of    the panel section was measured in ten locations.-   10. As a final possible application step the same products were    applied to the same panel sections using an orbital buffer. The    product was applied by smearing it on the foam orbital buffer pad. A    different pad was used for each of the products; one for standard    product and one for the one containing the GLENSURF™ 42 cationic    surfactant. Following the high speed buffing with the orbital    buffer, the gloss of the panel section was measured in ten    locations.    Results of Lab Testing:    A. Evaluation 1:

Compositions Tested:

1. S-NG-0.0GL (no GLENSURF™ 42), having the following formulation:

MATERIAL WT. % Water 32.329 Carbomer 940 0.1 Dowicil 75 0.070 Tween 602.0 Pamak 4A (Oleic Acid) 3.0 Mineral Spirits 15 Mineral Oil 9 Polestar400 13 KOH, 45% 0.5 Imsil A-8 16.665 Imsil A-10 8.335 Glensurf 42 0.0

2. S-NG-0.2GL (GLENSURF™ 42 include), having the following formulation:

MATERIAL WT. % Water 32.265 Carbomer 940 0.100 Dowicil 75 0.070 Tween 601.996 Pamak 4A (Oleic Acid) 2.994 Mineral Spirits 14.970 Mineral Oil8.982 Polestar 400 12.974 KOH, 45% 0.499 Imsil A-8 16.632 Imsil A-108.318 Glensurf 42 0.200

CHARACTERISTICS OF TEST PANEL Panel Color: Light Gray Panel Condition:Good, some surface imperfections Paint Thickness: 3.3–3.6 mil

Initial Gloss Readings (Results of Gloss readings from Step 2 of theTesting Procedure):

Side Left Left Right Right Polishing Product None None None None ProcessWet Sand Wet Sand Wet Sand Wet Sand Buffing/Orbital Speed By Hand ByHand By Hand By Hand Gloss Reading Angle 60 20 60 20 # of Gloss Readings10 10 10 10 Average Gloss Reading 4.71 1.58 5.25 1.47 Standard Deviation0.60 0.68 0.48 0.11

Comparative Gloss Readings After Treatment with Wool Buffer (Results ofGloss readings from Step 6 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG-0.0 S-NG-0.2S-NG-0.2 0.0 GL GL GL GL Process Wool Buff Wool Buff Wool Buff Wool BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Gloss Readings 10 10 10 10 Average 79.08 64.52 83.19 69.79 StandardDeviation 0.96 4.53 1.82 1.22

Comparative Gloss Readings After Treatment with Foam Buffer (Results ofGloss readings from Step 9 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG-0.0 S-NG-0.2S-NG-0.2 0.0 GL GL GL GL Process Foam Buff Foam Buff Foam Buff Foam BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Readings 10 10 10 10 Average 83.04 67.2 85.23 74.07 StandardDeviation 0.82 3.67 0.66 1.45

Comparative Gloss Readings After Treatment with Orbital Buffer (Resultsof Gloss readings from Step 10 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG-0.0 S-NG-0.0 S-NG-0.2S-NG-0.2 GL GL GL GL Process Orbital Orbital Orbital Orbital Foam FoamFoam Foam Buffer/Orbital Speed 1745 1745 1745 1745 Gloss Reading Angle60 20 60 20 # of Readings 10 10 10 10 Average 86.45 74.18 87.83 79.81Standard Deviation 1.63 4.83 1.43 0.69B. Evaluation 2:

Compositions Tested:

1. S-NG-0.0GL (no GLENSURF™ 42), having the following formulation:

MATERIAL WT. % Water 32.329 Carbomer 940 0.1 Dowicil 75 0.070 Tween 602.0 Pamak 4A (Oleic Acid) 3.0 Mineral Spirits 15 Mineral Oil 9 Polestar400 13 KOH, 45% 0.5 Imsil A-8 16.665 Imsil A-10 8.335 Glensurf 42 0.0

2. S-NG-0.2GL (GLENSURF™ 42 included), having the following formulation:

MATERIAL WT. % Water 32.265 Carbomer 940 0.100 Dowicil 75 0.070 Tween 601.996 Pamak 4A (Oleic Acid) 2.994 Mineral Spirits 14.970 Mineral Oil8.982 Polyetar 400 12.974 KOH, 45% Satintone 5 0.499 Imsil A-8 16.632Imsil A-10 8.318 Glensurf 42 0.200

CHARACTERISTICS OF PANEL TESTED Panel Color: Light Gray Panel Condition:Good, some surface imperfections Paint Thickness: 2.9–3.4 mil

Initial Gloss Readings (Results of Gloss Readings from Step 2 of theTesting Procedure):

Side Left Left Right Right Polishing Product None None None None ProcessWet Sand Wet Sand Wet Sand Wet Sand Buffing/Orbital Speed By Hand ByHand By Hand By Hand Gloss Reading Angle 60 20 60 20 # of Gloss Readings10 10 10 10 Average Gloss Reading 5.13 1.38 4.64 1.29 Standard Deviation0.45 0.10 0.56 0.16

Comparative Gloss Readings After Treatment with Wool Buffer (Results ofGloss Readings from Step 6 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 0.2GL0.2GL 0.0GL 0.0GL Process Wool Buff Wool Buff Wool Buff Wool BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Gloss Readings 10 10 10 10 Average 82.08 67.74 79.97 64.42 StandardDeviation 2.35 2.67 2.29 1.30

Comparative Gloss Readings After Treatment with Foam Buffer (Results ofGloss Readings from Step 9 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 0.2L0.2L 0.0L 0.0L Process Foam Buff Foam Buff Foam Buff Foam BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Readings 10 10 10 10 Average 85.59 70.11 80.09 64.68 StandardDeviation 2.84 3.02 1.71 0.57

Comparative Gloss Readings After Treatment with Orbital Buffer (Resultsof Gloss Readings from Step 10 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 0.2L0.2L 0.0L 0.0L Process Orbital Orbital Orbital Orbital Foam Foam FoamFoam Buffer/Orbital Speed 1745 1745 1745 1745 Gloss Reading Angle 60 2060 20 # of Readings 10 10 10 10 Average 86.45 78.18 85.93 77.35 StandardDeviation 1.63 1.90 2.29 1.50C. Evaluation 3

Compositions Tested:

1. S-NG-0.0GL (no GLENSURF™ 42), having the following formulation:

MATERIAL WT. % Water 32.329 Carbomer 940 0.1 Dowicil 75 0.070 Tween 602.0 Pamak 4A (Oleic Acid) 3.0 Mineral Spirits 15 Mineral Oil 9 Polestar400 13 KOH, 45% 0.5 Imsil A-8 16.665 Imsil A-10 8.335 Glensurf 42 0.0

2. S-NG-0.1GL (GLENSURF™ 42 included), having the following formulation:

MATERIAL WT. % Water 32.297 Carbomer 940 0.100 Dowicil 75 0.070 Tween 601.998 Pamak 4A (Oleic Acid) 2.997 Mineral Spirits 14.985 Mineral Oil8.991 Polestar 400 12.987 KOH, 45% 0.500 Imsil A-8 16.649 Imsil A-108.327 Glensurf 42 0.100

Characteristics of Panel Tested

CHARACTERISTICS OF PANEL TESTED Panel Color: Black Panel Condition: GoodPaint Thickness: Not Measured

Initial Gloss Readings (Results of Gloss Readings from Step 2 of theTesting Procedure):

Side Left Right Polishing Product None None Process Wet Sand Wet SandBuffing/Orbital Speed By Hand By Hand Gloss Reading Angle 60 60 # ofGloss Readings 5 5 Average Gloss Reading 4.72 5.46 Standard Deviation0.20 0.56

Comparative Gloss Readings After Treatment with Wool Buffer (Results ofGloss Readings from Step 6 of the Testing Procedure):

Side Left Right Polish Product S-NG-0.1GL S-NG-0.0GL Process Wool BuffWool Buff Buffer/Orbital Speed 1800 1800 Gloss Reading Angle 60 60 # ofGloss Readings 10 10 Average 81.73 80.98 Standard Deviation 0.30 0.29

Comparative Gloss Readings After Treatment with Foam Buffer (Results ofGloss Readings from Step 9 of the Testing Procedure):

Side Left Right Polish Product S-NG-0.1L S-NG-0.0L Process Foam BuffFoam Buff Buffer/Orbital Speed 1800 1800 Gloss Reading Angle 60 60 # ofReadings 10 10 Average 89.45 85.56 Standard Deviation 0.83 0.33

Comparative Gloss Readings After Treatment with Orbital Buffer (Resultsof Gloss Readings from Step 10 of the Testing Procedure):

Side Left Right Polish Product S-NG-0.1L S-NG-0.0L Process Orbital FoamOrbital Foam Buffer/Orbital Speed 1745 1745 Gloss Reading Angle 60 60 #of Readings 10 10 Average 89.36 87.46 Standard Deviation 0.62 0.51D. Evaluation 4

Compositions Tested:

1. S-NG-0.0GL (no GLENSURF™ 42), having the following formulation:

MATERIAL WT. % Water 32.329 Carbomer 940 0.1 Dowicil 75 0.070 Tween 602.0 Pamak 4A (Oleic Acid) 3.0 Mineral Spirits 15 Mineral Oil 9 Polestar400 13 KOH, 45% 0.5 Imsil A-8 16.665 Imsil A-10 8.335 Glensurf 42 0.0

2. S-NG-1.0GL (GLENSURF™ 42 included), having the following formulation:

MATERIAL WT. % Water 32.009 Carbomer 940 0.099 Dowicil 75 0.069 Tween 601.980 Pamak 4A (Oleic Acid) 2.970 Mineral Spirits 14.852 Mineral Oil8.911 Polestar 400 12.871 KOH, 45% 0.495 Imsil A-8 16.500 Imsil A-108.253 Glensurf 42 1.000

CHARACTERISTICS OF PANEL TESTED Panel Color: Brownish Gray (light rose)Panel Condition: Good Paint Thickness: 2.3–2.6 mil

Initial Gloss Readings (Results of Gloss Readings from Step 2 of theTesting Procedure):

Side Left Left Right Right Polishing Product None None None None ProcessWet Sand Wet Sand Wet Sand Wet Sand Buffing/Orbital Speed By Hand ByHand By Hand By Hand Gloss Reading Angle 60 20 60 20 # of Gloss Readings10 10 10 10 Average Gloss Reading 4.48 1.83 5.66 1.98 Standard Deviation0.30 0.05 0.46 0.06

Comparative Gloss Readings After Treatment with Wool Buffer (Results ofGloss Readings from Step 6 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 1.0GL1.0GL 0.0GL 0.0GL Process Wool Buff Wool Buff Wool Buff Wool BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Gloss Readings 10 10 10 10 Average 91.94 75.74 89.18 76.66 StandardDeviation 0.53 0.84 1.36 0.47

Comparative Gloss Readings After Treatment with Foam Buffer (Results ofGloss Readings from Step 9 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 1.0GL1.0GL 0.0GL 0.0GL Process Foam Buff Foam Buff Foam Buff Foam BuffBuffer/Orbital Speed 1800 1800 1800 1800 Gloss Reading Angle 60 20 60 20# of Gloss Readings 10 10 10 10 Average 95 83.17 94.32 78.87 StandardDeviation 0.30 2.05 0.39 0.91

Comparative Gloss Readings After Treatment with Orbital Buffer (Resultsof Gloss Readings from Step 10 of the Testing Procedure):

Side Left Left Right Right Polish Product S-NG- S-NG- S-NG- S-NG- 1.0GL1.0GL 0.0GL 0.0GL Process Orbital Orbital Orbital Orbital Foam Foam FoamFoam Buffer/Orbital Speed 1745 1745 1745 1745 Gloss Reading Angle 60 2060 20 # of Readings 10 10 10 10 Average 93.47 81.06 90.21 78.84 StandardDeviation 0.33 0.56 0.62 1.09

The results from the above testing clearly show that polish compositionsincluding the GLENSURF™ 42 (a poly[oxyalkylene] ammonium cationicsurfactant) have gloss enhancement properties superior to thosecompositions without a poly[oxyalkylene] ammonium cationic surfactant.

Example 4 Comparative Field Testing

Field evaluation was conducted by a person experienced and trained inthe art of using these type of products. The evaluator was instructed toapply both of the test products in the same manner.

The test products were a one-step cleaner wax, REVIVE-IT DB, that didnot contain the GLENSURF 42 and another one-step cleaner wax, Revive-ItDBA, that contained GLENSURF 42. The two products had the followingformulations:

1. Revive-It DB formulation without GLENSURF™ 42:

GENERAL FUNCTION OF MATERIAL COMPONENT WT. % Mineral Spirits DryingAgent 20.5322 Dow Corning 530 Silicone Film Former 4.266 Dow Corning 531Silicone Film Former 0.657 Span 80 Surfactant 0.5715 Kaopolite SF ClayCleaner/Polish 4.000 Water Diluent or Vehicle 60.153 Satintone 5 ClayThickener/Filler 4.3785 Tomah C-340 Wax Film Former 2.4885 EmulsionTween 60 Surfactant 0.2 Imsil A-8 Microcrystalline Silica 1.677 AbrasiveImsil A-10 Microcrystalline Silica 0.833 Abrasive Dowicide APreservative/Biocide 0.09 Banana Fragrance Fragrance 0.14 FD&C YellowDye 0.008 Dye Orange Dye Dye 0.005 Glensurf 42 Gloss Enhancement 0.0

2. Revive-It DBA formulation with GLENSURF™ 42:

GENERAL FUNCTION OF MATERIAL COMPONENT WT. % Mineral Spirits DryingAgent 20.329 Dow Corning 530 Silicone Film Former 4.224 Dow Corning 531Silicone Film Former 0.650 Span 80 Surfactant 0.566 Kaopolite SF ClayCleaner/Polish 3.960 Water Diluent or Vehicle 60.449 Satintone 5 ClayThickener/Filler 4.335 Tomah C-340 Wax Film Former 2.464 Emulsion Tween60 Surfactant 0.198 Imsil A-8 Microcrystalline Silica 1.660 AbrasiveImsil A-10 Microcrystalline Silica 0.825 Abrasive Dowicide APreservative/Biocide 0.089 Banana Fragrance Fragrance 0.139 FD&C YellowDye 0.008 Dye Orange Dye Dye 0.005 Glensurf 42 Gloss Enhancement 0.099

The evaluator applied both formulations to a Toyota Camry having darkgreen paint with shallow to deep scratches and light oxidation. Afterapplication, each product was buffed with a high speed buffer at 1800rpm.

After performing the test, the evaluator completed an evaluation formrating the products on a scale of 1 to 5, with 1 being poor, and 5 beingexcellent. The evaluator was also asked to provide additional comments.

The formulation without the GLENSURF™ 42 was rated as a 3. The evaluatoralso indicated that a lot of dust was produced during buffing, and theresulting shine was not as great as the shine produced by the productincluding GLENSURF™ 42.

The formulation including the GLENSURF™ 42 was rated as a 4. Theevaluator also indicated that there was little dusting during buffing,and that a deeper shine was produced in comparison to the product notincluding the GLENSURF™ 42.

The above specification, examples and data provide a completedescription of the manufacture and use of the composition of theinvention. Since many embodiments of the invention can be made withoutdeparting from the spirit and scope of the invention, the inventionresides in the claims hereinafter appended.

1. A composition comprising: at least one poly(oxyalkylene) ammoniumcationic surfactant; and a hydrocarbon solvent, wherein thepoly(oxyalkylene) ammonium cationic surfactant comprises a compound ofthe formula:

wherein R, R¹ and R² are independently selected from a C₁-C₄ alkylgroup, R³ comprises a polyoxyalkylene chain, and X⁻ comprises an anion.2. The composition of claim 1, wherein the polyoxyalkylene chain is agroup comprising a formula selected from:

wherein m is from 0 to 30, n is from 1 to 60, and m plus n is from 1 to60, and n>m.
 3. The composition of claim 2, wherein the ratio of n/m isat least
 2. 4. The composition of claim 2, wherein the ratio of n/m isat least
 4. 5. The composition of claim 2, wherein m plus n is withinthe range of 5 to
 60. 6. The composition of claim 1, wherein thecomposition comprises about 0.01 to about 10% by weight of thepoly(oxyalkylene) ammonium cationic surfactant.
 7. The composition ofclaim 1, wherein the composition comprises about 0.05 to about 5% byweight of the poly(oxyalkylene) ammonium cationic surfactant.
 8. Thecomposition of claim 1, wherein the composition comprises about 0.1 toabout 1% by weight of the poly(oxyalkylene) ammonium cationicsurfactant.
 9. The composition of claim 1, wherein the base polishcomprises: an anionic or nonionic surfactant; and a polishing agent; andwherein the poly(oxyalkylene) ammonium cationic surfactant is dispersedwithin the base polish.
 10. The composition of claim 9, wherein thecomposition comprises: about 10 to about 90% by weight vehicle ordiluent; about 0.1 to about 10% by weight of the anionic or nonionicsurfactant; about 5 to about 90% by weight of the polishing agent; andabout 0.01 to about 10% by weight of the poly(oxyalkylene) ammoniumcationic surfactant.
 11. The composition of claim 9, wherein thepolishing agent is selected from an abrasive, a cleaner, film formingagent, and mixtures thereof.
 12. The composition of claim 1, wherein thecomposition comprises an oil in water emulsion.
 13. The composition ofclaim 1, wherein the composition comprises a water in oil emulsion. 14.A composition comprising: about 10 to about 90% by weight of ahydrocarbon solvent; about 0.1 to about 10% by weight of an anionic ornonionic surfactant; about 5 to about 90% by weight of a polishingagent; and about 0.01 to about 10% by weight of at least onepoly(oxyalkylene) ammonium cationic surfactant; wherein thepoly(oxyalkylene) ammonium cationic surfactant comprises a compound ofthe formula:

wherein R, R¹ and R² are independently selected from a C₁-C₄ alkylgroup, R³ comprises a polyoxyalkylene chain, and X comprises an anion.15. The composition of claim 14, wherein the polyoxyalkylene chaincomprises a group selected from the formulas:

wherein m is from 0 to 30, n is from 1 to 60, and m plus n is from 1 to60, and n>m.
 16. The composition of claim 15, wherein n/m is at least 5.17. The composition of claim 15, wherein m plus n is within the range of8 to
 50. 18. The composition of claim 15, wherein m is 0 and n is in therange of 35 to
 45. 19. The composition of claim 14, wherein X⁻ is ananion is selected from chloride, bromide, iodide, sulfate, paratoluenesulfonate, acetate, nitrate, nitrite, phosphate, and mixtures thereof.20. The composition of claim 14, wherein the composition comprises about0.05 to about 5% by weight of the polyoxyalkylene ammonium cationicsurfactant.
 21. The composition of claim 20, wherein the compositioncomprises about 0.1 to about 1% by weight of the poly(oxyalkylene)ammonium cationic surfactant.
 22. A composition comprising: at least onepoly(oxypropylene) ammonium cationic surfactant; a hydrocarbon solvent;and a polishing agent; wherein the poly(oxypropylene) ammonium cationicsurfactant comprises a compound of the formula:

wherein R, R¹ and R² are independently selected from a C₁-C₄ alkylgroup, R³ comprises a polyoxyalkylene chain, and X comprises an anion.23. The composition of claim 22, wherein the poly(oxypropylene) chain isa group comprising a formula selected from:

wherein m is from 0 to 30, n is from 1 to 60, and m+n is from 1 to 60,and n>m.
 24. The composition of claim 23, wherein m+n is within therange of 5 to
 60. 25. The composition of claim 23, wherein thecomposition comprises about 0.05 to about 5% by weight of thepoly(oxypropylene) ammonium cationic surfactant.
 26. The composition ofclaim 22, wherein the base polish further comprises at least one of ananionic surfactant and a nonionic surfactant.